Molybdenum sputtering targets Machined parts

Molybdenum sputtering target is a target material used in physical vapor deposition (PVD) or magnetron sputtering (sputtering) processes. Molybdenum is a metallic element with good thermal conductivity, corrosion resistance and mechanical properties and is therefore widely used in the preparation of thin films and coatings.

Molybdenum Sputtering Targets are commonly used for the preparation of functional films such as conductive films, optical films, corrosion-resistant films, etc. They are also used for the preparation of optical lenses, optical filters and other optical components. Molybdenum sputtering targets are prepared by powder metallurgy, hot compression molding, hot isostatic pressing, and other methods to ensure high purity, uniformity, and densification of the targets.

The specifications and shapes of molybdenum sputtering targets can be customized according to customers' needs, and common shapes include disc, square, rectangle and so on. During use, care needs to be taken to keep the surface of the target clean and flat to ensure the stability of the sputtering process and the quality of the film layer.